Formation of thin Crsi2 films by the solid-phase ion-plasma method and their thermoelectric properties

Bekpulatov I., Imanova G., Umirzakov B., Dovranov K., Loboda V., Jabarov S., ...More

Materials Research Innovations, vol.28, no.4, pp.221-228, 2024 (Scopus) identifier

  • Publication Type: Article / Article
  • Volume: 28 Issue: 4
  • Publication Date: 2024
  • Doi Number: 10.1080/14328917.2024.2339001
  • Journal Name: Materials Research Innovations
  • Journal Indexes: Scopus, Academic Search Premier, Aerospace Database, Applied Science & Technology Source, Chemical Abstracts Core, Communication Abstracts, Compendex, Computer & Applied Sciences, INSPEC, Metadex, Civil Engineering Abstracts
  • Page Numbers: pp.221-228
  • Keywords: CrSi2 films, Ion-plasma, single crystals, solid-phase, thermoelectric properties
  • Azerbaijan State University of Economics (UNEC) Affiliated: No

Abstract

CrSi2 thin films with different thicknesses obtained on the Si(111) surface by magnetron sputtering method have been investigated using complex of electron spectroscopy and microscopy methods. The thin films’ composition, surface morphology, and cross-section, as well as the resistivity’s, Seebeck coefficient’s, and power factor’s temperature dependences have been studied for the first time. It has been established that, starting from a thickness of ~ 400 Å (deposition time ~ 60 sec), the SiO2/Si(111) surface is completely covered with an amorphous CrSi2 film. After heating the CrSi2/SiO2/Si(111) system at T ≈ 750 K, a homogeneous polycrystalline CrSi2/SiO2/Si(111) film is formed. It is shown that the resistivity ρ, the Seebeck coefficient S, and the power factor P of a CrSi2/SiO2/Si(111) film of different thicknesses (80 and 180 nm) change nonlinearly with increasing temperature. Their values for CrSi2 films of different thicknesses differ slightly from each other.